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The Characteristics of Atomic Layer Deposition Technology and its Application Status in Aerospace Field
GAO Hengjiao, XIONG Yuqing, ZHANG Wentai, ZHANG Kaifeng, CAO Shengzhu, CHENG Gong
2022, 42(4): 237-243. DOI: 10.13922/j.cnki.cjvst.202111012
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Application Mechanism and Prospects of Pulsed Technology in Arc Ion Plating
CAO Shiyi, DAI Wei, WANG Junfeng
2022, 42(4): 244-255. DOI: 10.13922/j.cnki.cjvst.202111007
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Cerium-Induced Surface Reconstructions and Phase Transition on Si（111）
WANG Chang, WANG Xuesen, XIAO Wende
2022, 42(4): 256-259. DOI: 10.13922/j.cnki.cjvst.202112020
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Experimental Study on the Effect of Lunar Dust Deposition on Short-Circuit Current of Solar Cell
LU Ziyang, WANG Yongjun, LI Detian, WANG Yi, SUN Binwen, ZHANG Haiyan, ZHUANG Jianhong, DENG Yongsheng, GUO Lixin
2022, 42(4): 260-268. DOI: 10.13922/j.cnki.cjvst.202111019
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Structural Optimization of Pressure Matcher with Large Compression Ratio Based on a Subcritical Unit
TAN Sizhe, RONG Wenjie, LI Baokuan
2022, 42(4): 269-275. DOI: 10.13922/j.cnki.cjvst.202111021
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Numerical Simulation of Flow Conductivity of Vacuum Pipeline under Different Flow Regimes
ZHANG Yicong, BI Hailin, FAN Xiang, ZUO Guizhong, CHEN Zhaoxi, WANG Xudi
2022, 42(4): 276-281. DOI: 10.13922/j.cnki.cjvst.202201003
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Influence of the Voltage on the Plasma Characteristics in the Radio Frequency Hollow Cathode Discharge
HE Liuliang, HE Feng, OUYANG Jiting, WANG Ronggang
2022, 42(4): 282-289. DOI: 10.13922/j.cnki.cjvst.202110001
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Field Emission Properties of Graphene Edge Based on Surface Textured Substrates
CHENG Guilin, YANG Jianjun, QUAN Sheng, ZHONG Jian, YU Junsheng
2022, 42(4): 290-295. DOI: 10.13922/j.cnki.cjvst.202110011
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Power Factor and Discharge Power Prediction Model of Dielectric Barrier Discharge Based on GA-BP
SHEN Yunhui, CHENG Shiye, LU Na, GUO Yafeng
2022, 42(4): 296-303. DOI: 10.13922/j.cnki.cjvst.202108010
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Numerical Simulation of Pulsed Discharge Plasma in Water Based on COMSOL
ZHU Zhihao, LAN Sheng, FENG Zhiyuan, LU Kun
2022, 42(4): 304-310. DOI: 10.13922/j.cnki.cjvst.202112004
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Growth and Characterization of DC Magnetron Sputtered GZO Films
ZHANG Jian, QI Zhenhua, LI Jianhao, NIU Xiabin, TANG Zhicong
2022, 42(4): 311-316. DOI: 10.13922/j.cnki.cjvst.202109002
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