Application Mechanism and Prospects of Pulsed Technology in Arc Ion Plating

Pulsed power technologies are widely used in vacuum plasma coating because they provide enhanced ionization,strong adhesion,high-efficiency deposition,and access to smooth and dense films.In this paper,the applications of pulsed power technology in arc ignition,arc source,substrate bias,etc.,are briefly described.From the overall view of plasma generation,transmission process,and particle deposition,the interaction mechanisms between pulsed parameters and arc spot motion,target utilization,ionization state(energy,proportion,and density),and coating performance are analyzed.The advantages and differences of pulsed and DC technology in arc plasma coating are compared and analyzed.Meanwhile,it is proposed that the existing pulsed technology still needs to overcome technical difficulties such as batch stability,parameter matching between arc source and bias source,and especially high-energy electromagnetic interference.It provides a useful theoretical basis and process reference for a broader application of pulsed power technology.