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平板显示行业用金属溅射靶材的市场需求分析

Analysis of Market Demand and Supply of Sputtering Target in Flat-Panel Display Industry

  • 摘要: 薄膜晶体管液晶显示面板(TFT-LCD)是当前的主流平面显示技术,而金属溅射靶材是制造TFT-LCD过程中最关键的材料之一。目前,国内主流的8.5代液晶显示面板生产线所使用的金属溅射靶材,以铝、铜、钼和钼铌合金等四种靶材的需求量最大,且每套包含12块条靶,每块条靶的尺寸约为:2650 mm×210 mm×18 mm。其中,铝靶和铜靶主要被爱发科电子材料有限公司等日资企业主导,钼条靶正在被国内的洛阳高新四丰电子材料有限公司等企业全面替代,钼铌合金主要被日本日立金属和德国世泰科所垄断。

     

    Abstract: The status-quo of the domestic market demand and supply of metal and/or alloy target materials for synthesis of thin film by magnetron sputtering in 8. 5-generation production line of thin-film transistor (TFT) liquid crystal display panel (LCD), was tentatively reviewed. The discussions with specific examples focused on:i) large annual consumption of target material in China, including but not limited to Al, Cu, Mo, and MoNb-alloy targets, comprising 12 plate-strip sub-target (2650 mm×210 mm×18 mm in size); ii) leading suppliers of A-and Cu-targets, such as ULVAC Japan LCD; and iii) high quality plate strip Mo-target manufactured by China's companies, for instance, Luoyang Sifon Electronic Materials Co. When it comes to advanced targets fabricated by self-reliance, including Mo Nb-alloy target, the problems and possible solutions were briefly discussed in a thought provoking way.

     

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