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溅射气压对MoS2涂层结构调控及其电催化性能影响

Effect of Sputtering Pressure on Structure Regulation and Electrocatalytic Performance of MoS2 Coatings

  • 摘要: 二硫化钼(MoS2)具有独特电子结构,被认为是过渡金属硫化物析氢反应(HER)的潜在替代贵金属铂(Pt)的催化剂。然而,MoS2的析氢催化效率受限于活性位点不足和导电性不佳等问题。本研究提出一种采用磁控溅射技术制备MoS2涂层作为HER电催化剂的方法。通过在0.5 Pa、1.0 Pa、1.5 Pa 和 2.0 Pa的不同氩气压力下制备MoS2涂层,研究了微观结构、组织形貌及其在碱性介质中的HER活性。结果表明,不同氩气压力下制备的MoS2涂层均沿(100)晶面生长,暴露了大部分活性位点;同时,低氩气压力下制备的涂层中出现1T相 MoS2,且在1.0 Pa 时1T相含量最高,导电性更强。在1 mol/L 氢氧化钾(KOH)溶液中,该涂层在10 mA/cm2和100 mA/cm2电流密度下的过电位分别为149 mV和225 mV,塔菲尔(Tafel)斜率为75 mV·dec−1

     

    Abstract: MoS2 exhibits a distinctive electronic configuration akin to that of platinum, it is considered as a potential catalyst for transition metal sulfide hydrogen evolution reaction (HER). Nevertheless, the catalytic efficiency of MoS2 in hydrogen evolution is hampered by insufficient active sites and inadequate electrical conductivity. This study presents a technique for fabricating MoS2 coatings as an electrocatalyst for HER using magnetron sputtering. The microstructure, microstructure morphology and HER activity in alkaline media of MoS2 coatings were investigated by preparing MoS2 coatings at different argon pressures of 0.5 Pa, 1.0 Pa, 1.5 Pa and 2.0 Pa. Results show that the MoS2 coating grows along the (100) crystal surface under different Ar pressures, exposing most of the active sites. At the same time, 1T phase MoS2 appears in the coatings at low Ar pressure, and the 1T phase component is the most at 1.0 Pa, and the conductivity is stronger. In a 1 mol/L potassium hydroxide (KOH) solution, the overpotential of the coating at current densities of 10 mA/cm2 and 100 mA/cm2 is 149 mV and 225 mV, respectively, and the Tafel slope is 75 mV·dec−1.

     

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