Abstract: Electron Beam Lithography (EBL) stands as a pivotal micro-nano Fabrication technology, indispensable for patterning at sub-micrometer and even nanometer scales. It plays a crucial role in the field of micro-nano Fabrication distinguished by its superior patterning fidelity and exceptional flexibility. This paper presents a systematic review of the fundamental physical principles of EBL and the evolutionary trajectory of its instrumentation. It specifically elaborates on the progression from early Gaussian beam systems based on scanning electron microscopes to the commercial Variable Shaped Beam and cutting-edge Multi-beam systems, which were developed to overcome throughput and precision bottlenecks. Building upon the latest research advancements, this review further discusses the future development trends of EBL systems and their associated technologies. The insights provided aim to offer theoretical support and practical reference for academic research and industrial development in related fields.