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齐熙展, 田凤杰, 崔雨. PECVD进气盖板结构对腔室温度场影响规律研究[J]. 真空科学与技术学报. DOI: 10.13922/j.cnki.cjvst.202407012
引用本文: 齐熙展, 田凤杰, 崔雨. PECVD进气盖板结构对腔室温度场影响规律研究[J]. 真空科学与技术学报. DOI: 10.13922/j.cnki.cjvst.202407012
QI Xizhan, TIAN Fengjie, CUI Yu. The Influence of the Structure of PECVD Intake Cover on Its Temperature Field[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY. DOI: 10.13922/j.cnki.cjvst.202407012
Citation: QI Xizhan, TIAN Fengjie, CUI Yu. The Influence of the Structure of PECVD Intake Cover on Its Temperature Field[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY. DOI: 10.13922/j.cnki.cjvst.202407012

PECVD进气盖板结构对腔室温度场影响规律研究

The Influence of the Structure of PECVD Intake Cover on Its Temperature Field

  • 摘要: 半导体薄膜沉积技术中反应腔室的温度控制直接影响晶圆沉积薄膜的质量与精度,为了良好实现在工艺过程中腔室温度的准确性和一致性,进行了腔室的重要部件进气盖板结构对温度场的影响特点及规律的研究。对进气盖板进行了结构拓扑设计、以及整体腔室温度场的理论分析与仿真研究。对比仿真结果,分析盖板不同散热结构对腔室内温度场的分布和影响规律。研究结果发现:在不受射频干扰下,进气盖板的三种不同散热结构对腔室温度场没有明显影响。喷淋板下方2 mm处温度场温度分布均匀,随散热通道与腔室距离变化波动很小,整体温度呈中间高边缘低的特质。在射频的干扰下,散热通道与腔室距离越远,其对腔室温度控制能力变弱,腔室温度场的温度保持性会变差,温度一致性大大降低。

     

    Abstract: The temperature control of the reaction chamber in semiconductor thin film deposition technology directly affects the quality and accuracy of products, and the influence of chamber structure on the temperature field was studied. The structural topology design of the intake panel, which is an important component of the chamber, and the theoretical analysis and simulation of the temperature field of the whole chamber are carried out. By comparing the simulation results, the distribution of the temperature field under different cooling conditions is analyzed, and the influence rule of different cooling conditions on the temperature field is summarized. The results show that the different structure of the intake cover has no obvious effect on the chamber temperature field without RF interference. The temperature distribution of the temperature field 2 mm below the spray plate is uniform, and it fluctuates little with the distance between the radiating position and the chamber. Under the interference of RF, the further away the radiating channel is from the chamber, the weaker the control ability of the radiating channel is.

     

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