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溅射功率对MoS2涂层结构及其电催化性能影响

Effect of Sputtering Power on the Structure and Electrocatalytic Performance of MoS2 Coating

  • 摘要: 以二硫化钼(MoS2)为代表的非贵金属产氢电催化剂因较高的催化性能在析氢催化方面引起广泛关注。本文采用磁控溅射法在泡沫镍(NF)基底上制备了MoS2催化涂层,研究了1000 W、1500 W、2000 W和3000 W不同溅射功率对MoS2涂层微观结构、组织形貌以及电化学起始过电位的影响。结果表明:溅射功率的改变会影响溅射离子能量从而影响MoS2涂层的结构形貌、相结构及电化学性能。不同溅射功率下MoS2涂层都呈现为蠕虫状生长且出现1T相成分,随着功率的升高表面形貌呈现沿 (100)晶面择优取向,在1500 W时(100)衍射峰最强,涂层蠕虫状结构出现了很多细小的分支,涂层边缘暴露接触点位最多。通过电化学性能测试结果显示随着溅射功率的增大,MoS2涂层的电化学起始过电位先减小后增大,在1500 W溅射功率下过电位最小,在10 mA/cm2电流密度下其起始过电位值为148.5 mV。

     

    Abstract: Non-precious metal hydrogen-producing electrocatalysts represented by molybdenum disulfide (MoS2) have attracted wide attention in hydrogen evolution catalysis due to their high catalytic performance. In this paper, the catalytic MoS2 coating was prepared on a nickel foam (NF) substrate by magnetron sputtering method. The effects of different sputtering powers of 1000 W, 1500 W, 2000 W and 3000 W on the microstructure, microstructure and electrochemical initial overpotential of MoS2 coating were studied. The results show that the change of sputtering power will affect the sputtering ion energy and thus affect the structural morphology, phase structure and electrochemical properties of MoS2 coating. At different sputtering powers, the MoS2 coating shows worm-like growth and 1T phase composition, with the increase of power, the surface morphology presents a preferred orientation along the (100) crystal surface. At 1500 W, the diffraction peak (100) is the strongest, the worm-like structure of the coating has many small branches, and the edge of the coating has the most exposed contact points. The electrochemical performance test results show that with the increase of sputtering power, the electrochemical initial overpotential of MoS2 coating first decreases and then increases. The overpotential is the smallest at 1500 W sputtering power, and the initial overpotential is 148.5 mV at 10 mA/cm2 current density.

     

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