Abstract: Diamond is one of the important functional materials because of its excellent acoustic, optical, electrical, thermal and mechanical properties. The preparation methods of the diamond mainly include high temperature and high pressure (HTHP) method and low pressure chemical vapor deposition (CVD) method. Chemical vapor deposition is an important method for diamond film synthesis due to the characteristics of high quality, large area, simplicity and scalability. At present, thorough research has been done on controlling the low-pressure growth of diamond film to achieve uniform, rapid, large size and high-quality growth. In this paper, the research progress of the CVD method (including hot filament CVD, plasma enhanced CVD, and combustion flame CVD) growing diamond film in recent years is reviewed, including the growing mechanism, key equipment and process parameters. In addition, the relationship between key parameters and growth rate, as well as the quality of diamond film, is discussed in detail, which is very important for the research and production of diamond film prepared by the chemical vapor deposition method.