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Mg85Ni15减反层对玻璃衬底上VO2薄膜光电性能的影响

Influence of Mg85Ni15 Anti-Reflection Layers on Photoelectric Properties of the VO2 Thin Films on Glass Substrate

  • 摘要: 采用脉冲激光沉积技术,在非晶玻璃衬底上生长单斜晶相的二氧化钒(M-VO2)薄膜,并研究了Mg85Ni15减反层对M-VO2薄膜性能的影响。实验结果表明:在非晶玻璃衬底上制备的M-VO2薄膜具有单一取向且纯度较高,并具有良好的光电热致转变性能。Mg85Ni15作为减反层,在没有特别降低电学性能的基础上,提高了薄膜的可见光透过率和太阳能调节率。通过对减反层厚度的优化发现:在减反层厚度为60 nm时,相变温度最低,且热滞宽度最窄为6℃。此工作的开展有利于推进VO2薄膜在智能窗方面的应用。

     

    Abstract: A monoclinic phase of vanadium dioxide (M-VO2) film was grown on an amorphous glass substrate by pulsed laser deposition technique, and the effect of the Mg85Ni15 anti-reflection layers on the M-VO2 film was investigated. The experimental results show that the M-VO2 film prepared on the amorphous glass substrate has a single orientation and high purity. As an anti-reflection layer, Mg85Ni15 improves the visible light transmittance and solar energy adjustment rate of the film. By optimizing the thickness of the anti-reflection layer, it is found that when the thickness of the anti-reflection layer is 60 nm, the phase transition temperature is the lowest and the thermal hysteresis width is the narrowest at 6℃. The development of this work is conducive to promoting the application of VO2 thin films in smart windows.

     

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