Abstract: High vacuum acquisition and maintenance technology is crucial for scientific research and industrial applications in the fields of micro nano material preparation, microelectronic equipment manufacturing, and vacuum electronic device process optimization. Key scientific issues about the suction mechanism of getter materials and the optimizing material substitution during the acquisition and maintenance of high vacuum are emphasized in this work. It is committed to overcoming shortcomings of traditional high vacuum technology, such as high energy consumption in maintaining high vacuum state, and the dependence of traditional high vacuum acquisition methods on expensive equipment and complex operations. A new method based on the induction of high vacuum acquisition and pressure lower limit breakthrough by fresh glass crushing surface is proposed. This work first conducts experiments on the composition and partial pressure of the suction, as well as experiments on breaking through the lower limits of molecular pump pressure and ion pump pressure under open states. Fresh glass shattered surfaces are found to have suction effects. The main gas components and partial pressure changes adsorbed on the fresh glass surface are analyzed. The main adsorbed gas components are found to be H₂ and N₂. The pumping capacity of the new method is quantitatively evaluated. The pipeline transmission probability of the pump outlet and the maximum effective pumping speed are analyzed by performing Monte-Carlo simulations. Compared with existing vacuum acquisition and maintenance technologies, the high vacuum acquisition method proposed in this work has advantages such as easy activation, high material cost performance, and observable pumping speed, which can help to provide new theoretical and technical approaches and effective application references for acquiring and maintaining high vacuum in narrow spaces.