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面向未来信息器件的原子制造技术

Atomic Manufacturing Technology for the Future Information Devices

  • 摘要: 未来信息器件朝着更小尺寸、更低功耗、更高性能的方向发展,其制造技术必将进入到原子尺度,原子制造技术的发展将会孕育出颠覆性的新材料和新器件。本文综述了有望发展为规模化原子制造技术的一些制备方法,如分子束外延技术、扫描探针操纵技术、化学气相制备技术、原子级刻蚀技术等,同时分析了发展面向未来信息器件的原子制造技术所面临的难题,展望了原子制造技术的应用前景和发展趋势。

     

    Abstract: With the development of the future information devices towards smaller sizes, lower energy consumption, and higher properties, the manufacturing technology must enter the atomic scale. The atomic manufacturing technology will produce the revolutionary new materials and devices. This review summaries some fabrication methods to be developed scalable atomic manufacturing technologies such as molecular beam epitaxy, scanning probe manipulation, chemical vapour fabrication, and atom-scale etching. The problems, prospect, and tendency in the development of atomic manufacturing technology for the future information devices have been discussed.

     

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