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生长温度对Cr原子掺杂在Bi2Se3中位置及磁性的影响

The Effects of Growth Temperature on the Position and Magnetic Properties of Cr in Bi2Se3

  • 摘要: 本文报道用分子束外延(Molecular Beam Epitaxy: MBE)技术制备了优良的铬(Cr)掺杂硒化铋(Cr-Bi2Se3)薄膜样品。通过反射高能电子衍射 (Reflective High Energy Electron Diffraction: RHEED)、X射线衍射 (X-ray diffraction: XRD) 技术和电磁输运系统对Cr-Bi2Se3进行测试。实验结果显示:较低的生长温度下Cr进入Bi2Se3中替代Bi位形成CrBi;较高的生长温度下Cr进入Bi2Se3中的范德瓦尔斯间隙形成层间(Interlayer)CrI,这一区别导致Cr-Bi2Se3在生长速率及磁性等方面表现出不同的性质。所以可以通过控制生长温度来调制Cr的掺杂位置,得到更理想的效果。

     

    Abstract: This paper reports the preparation of chromium (Cr) - doped Bismuth Selenide (Cr-Bi2Se3) thin films by Molecular Beam Epitaxy (MBE). Cr-Bi2Se3 was tested by Reflective High Energy Electron Diffraction (RHEED), X-ray diffraction (XRD) and electromagnetic transport system. The experimental results show that most Cr atoms enter Bi2Se3 and replace Bi site to form CrBi at low growth temperatures; At higher temperatures, a significant part of Cr atoms enter the van der Waals gap forming interlayer CrI, which leads to different magnetic properties of Cr- Bi2Se3. Therefore, we can adjust the Cr doping position by controlling the growth temperature to obtain a better effect.

     

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