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原位制备量子器件的掩模光刻

Stencil Lithography for in-Situ Fabricating Quantum Devices

  • 摘要: 在特定区域的单晶薄膜生长已经能通过掩模光刻的方法所达成。这种方法作为一种不同材料合成的工具,它能用于沉积不同种类的材料,尤其是近年新出现的量子材料。在本综述中,回顾了利用掩模光刻在原位量子材料微观器件的制备应用。本文首先描述了掩模光刻的基本特性、主要技术参数和优势,然后展开关于量子材料如何在这些技术特点和优势中获益的讨论。最后强调掩模光刻在材料工程、原位量子器件制备的应用。本综述阐述了一个在制备技术和量子材料的新的交叉方向,这一方向逐渐获得越来越多的关注和研究。

     

    Abstract: The growth of single-crystal films over a desired area but nowhere else could be accomplished using the stencil lithography technique. Served as an accessory for different material synthesis methods, this technique could be used for depositing various materials particularly the emergent quantum materials. We review the applications of stencil lithography for in-situ fabricating quantum material devices in mesoscopic scale. The basics of stencil lithography with the main specifications and advantages are introduced, followed by describing how quantum materials can be benefitted from these characteristics and advantages. We highlight the applications of stencil lithography to the material engineering and the in-situ fabrications of quantum devices. The present review describes a new disciplinary direction between the fabrication technique and quantum materials, which gets more and more attention and deserves further investigations.

     

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