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HALF银铜管道的多腔TiZrV镀膜初步研究

Multi-Chamber TiZrV Coating in OFS Copper Vacuum Chamber for HALF

  • 摘要: NEG镀膜技术可以在狭长的真空腔内实现超高真空,这对衍射极限储存环至关重要。为满足HALF光源工程对NEG镀膜真空腔的进度和质量需求,基于之前的单管NEG镀膜工作,发展了多腔镀膜技术并开展了系列技术研究,利用扫描电子显微镜,原子力显微镜,能量色散 X 射线能谱对NEG薄膜进行表征,利用X射线光电子能谱对NEG薄膜的激活特性进行分析。结果表明多腔系统中各真空管之间,以及与之前的单管镀膜真空管内壁薄膜的表面形貌,断面形貌,表面粗糙度和组成成分大体相同,在180℃保温2 h后,NEG薄膜表面的金属高价态被还原成了低价态并出现了Ti、Zr、V的金属态,这与之前单个镀膜真空腔的结果一致。三根此种方法镀膜真空腔串联安装,并配有SIP组成真空系统来模拟HALF储存环真空的实际工作状态。经180℃激活24 h后,腔体远端真空度为4.13×10−8 Pa,且真空度随时间变化缓慢变好,放置260 h后真空度可以达到3.74×10−8 Pa,这将为HALF真空系统工作提供有利的技术支持。

     

    Abstract: NEG coating is a competitive candidate to achieve ultra-high vacuum in narrow gap vacuum chambers, which is very important for diffraction-limited storage ring. To get enough NEG coated chambers in schedule for HALF, a multi-chamber coating system was employed, and some multi-coating research was performed based on previous work. The NEG film was characterized and analyzed by scanning electron microscopy, atomic force microscopy, and energy dispersive X-ray energy spectroscopy, and the activation characteristics of NEG films were analyzed by X-ray photoelectron spectroscopy. The results show that the surface morphology, cross-sectional morphology, surface roughness, and composition of the film coated by different chambers are about the same. After activation at 180°C for 2 h, the high oxidation state of the surface metal was transferred to a low oxidation state or metallic state, which is similar to that of the previous single-chamber coating. Three NEG coated chambers were equipped with SIP to simulate work status, and after activation at 180°C for 24 h, the pressure at the end of chambers was 4.13×10−8 Pa, which reached 3.74×10−8 Pa after about 260 h, which would benefit future HALF vacuum system.

     

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