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制备工艺对氟化物憎水薄膜性能的影响

Effects of Preparation Processes on the Properties of Fluoride Hydrophobic Films

  • 摘要: 研究不同工艺条件对憎水薄膜光学和憎水性能的影响。采用电子束热蒸发技术,通过控制镀膜的工艺参数(沉积温度、工作真空度、沉积速率),制备了不同的憎水薄膜。分析了不同条件下薄膜的折射率、消光系数和憎水性能,对膜系结构G/2HL/A的增透膜的透过率进行了测试分析。针对550 nm波长,当沉积温度从室温升高至180℃,憎水薄膜的的折射率的变化范围为1.4595-1.5559,消光系数变化范围为3.46×10-3-6.8×10-3,憎水角的变化范围为85.1°-119.3°,结果表明,随着沉积温度的提高,薄膜的折射率随之增大,消光系数略有提高但影响不大,薄膜的憎水性能先提高后降低。工作真空度从3×10-2Pa提高到1×10-2Pa,憎水膜的折射率变化范围为1.4136-1.5476,消光系数变化范围为3.94×10-3-5.3×10-3,憎水角的变化范围为97.3°-119.3°,结果表明,随着工作真空度的提升,薄膜的折射率随之增大,憎水性能随之下降。当沉积速率从0.33增加到0.91 nm/s,薄膜的折射率变化范围为1.494 6-1.583 8,消光系数为4.14×10-3-7.87×10-3,憎水角的变化范围为106.6°-119.3°,结果表明,随着沉积速率的提高,薄膜的折射率也得到增加,薄膜的消光系数略有提升,其值相差不大。在沉积温度160℃,工作真空度1×10-2Pa和沉积速率0.51 nm/s时,薄膜的憎水性能最好,憎水角高达119.3°。采用最佳工艺参数,在增透膜表面镀制厚度10 nm左右的憎水膜,在400-800 nm处,单面镀膜的平均透过率,由95.28%变为95.31%,变化量仅为0.03%,憎水角可达119.2°,结果表明,薄膜不仅具有良好的光学性能,同时具有良好的憎水能力。

     

    Abstract: The influences of various process conditions on the optical and hydrophobic properties of hydrophobic films were studied.Hydrophobic films with various properties were prepared by electron beam thermal evaporation by controlling the process parameters (deposition temperature,pressure and deposition rate).The refractive index,extinction coefficient and hydrophobic angle of the film under different conditions were analyzed.The transmittance of the antireflective film with the film structure of G/2HL/A was measured and analyzed.The results show that for 550 nm wavelength,when the deposition temperature increases from room temperature to 180℃,the refractive index varies from 1.4595 to 1.5559,the extinction coefficient varies from 3.46×10-3 to 6.8×10-3,and the variation range of hydrophobic angle from 85.1°to 119.3°.The results show that with the increase in deposition temperature,the refractive index of the film increases,the extinction coefficient increases slightly,but the effect is small,and the hydrophobicity of the film increases first and then decreases.When the pressure increases from 3×10-2Pa to 1×10-2Pa,the refractive index varies from 1.4136 to 1.5476,the extinction coefficient varies from 3.94×10-3 to 5.3×10-3,and the variation range of hydrophobic angle from 97.3°to 119.3°.The results show that with the increase in working vacuum,the refractive index of the film increases,and the hydrophobicity decreases.As the deposition rate increases from 0.33 nm/s to 0.91 nm/s,the refractive index varies from 1.4946 to 1.5838,the extinction coefficient increases from 4.14×10-3to 7.87×10-3,and the variation range of hydrophobic angle from 106.6°to 119.3°.The results show that with the increase in the deposition rate,the refractive index of the film is also increased,the extinction coefficient of the film is slightly improved,and its value is not much different.When the deposition temperature is 160℃,the pressure is 1×10-2Pa and the deposition rate is 0.51 nm/s,the hydrophobic film has the best hydrophobic performance,and the hydrophobic angle is up to 119.2°.Under the optimum process parameters,a hydrophobic film with a thickness of about 10 nm is plated on the surface of the antireflection film.From 400 nm to 800 nm,the average transmittance of single-sided coating changes from 95.28%to 95.31%,the variation is only 0.03%,and the hydrophobic angle can reach 119.2°.The results show that the hydrophobic film has good optical properties and hydrophobic ability.

     

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