Abstract:
In this work, magnetic vanadium oxide(VO
x) thin films were prepared on sapphire substrates by RF magnetron sputtering. The effects of codeposition of Mn on the surface morphology and ferromagnetism of VO
x were investigated. The results of structure and morphology characterization show that the VO
x film prepared by us is a kind of pure vanadium oxide film with a stoichiometric ratio between V
2O
3 and VO
2. The introduction of Mn element causes slight distortion of VO
xlattice, and the morphology of VO
x evolves from a nano-rod structure to a spherical structure. The results of magnetic properties show that VO
x films exhibited room-temperature ferromagnetic properties. With the ratio of Mn to V being 1:1, the saturation magnetic moment of the film first increases and then decreases. When the Mn content is 30%, the surface morphology is the most regular, and the maximum saturation magnetic moment is 345 emu/cm
3.