Abstract: Atomic layer deposition(ALD)is a kind of coating preparation technology with high precision that can realize the coating growth at the level of atomic thickness. ALD has great advantages in the coating thickness controlling,coating uniformity,coverage degree of complex structures,etc.,and is considered as a very effective preparation method of high-density coatings. In this paper,the characteristics,key technical problems,and the latest developments of ALD technology in the aerospace-related fields are reviewed. Aiming at the two key technologies of determination of reaction window temperature and the improvement of the deposition rate of ALD technology,the technical path of the theoretical research method based on the first principles and the space atomic layer deposition technology(SALD)are proposed,respectively,which provide ideas for the further development and application of ALD technology in the aerospace field.