Effect of DC Magnetron Sputtering on the Properties of Thin Films Deposited on the Surface of Shaped Workpieces
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摘要: 对于表面形状复杂的异形工件,在薄膜沉积过程中由于受到阴影效应的影响,将会造成薄膜厚度的不均匀以及表面性能和结构的差异,工件在应用过程中容易导致表面失效,降低其使用寿命。为了在异形工件表面获得厚度均匀的薄膜,本文采用直流磁控溅射镀膜方式和单一因素变量法,在不同的工作气压、衬底温度下对异形工件内表面进行薄膜的制备。使用台阶仪、扫描电镜,分别对所制备薄膜进行厚度均匀性和表面形貌检测。结果显示:在一定的工作气压和衬底加热温度范围内,通过改变工艺参数对提高沉积薄膜厚度的均匀性与表面质量是有效的。随着工作气压的逐渐增加,工件内表面的Au膜厚度均匀性升高,当工作气压提升至1.5 Pa时,薄膜厚度均匀性达到±3%;当衬底温度提升至400℃时,沉积薄膜厚度均匀性达到±5%,并且薄膜表面平整、无裂纹。Abstract: For shaped workpieces with complex surface shapes,the shadowing effect during the deposition process can cause non-uniform film thickness and differences in surface properties and structure,which can lead to surface failure and reduced service life during application.In order to obtain a uniform film thickness on the surface of shaped workpieces,this paper uses the DC magnetron sputtering coating method and the single factor variable method to prepare films on the inner surface of shaped workpieces at different working air pressures and substrate temperatures.The thickness uniformity and surface morphology of the prepared films were examined using a step meter and SEM,respectively.The results show that,within a certain range of working air pressure and substrate heating temperature,the process parameters can be changed effectively to improve the thickness uniformity and surface quality of the deposited films.The thickness uniformity of the Au film on the inner surface of the workpiece increased as the working air pressure was gradually increased,reaching±3%when the working air pressure was raised to 1.5 Pa.When the substrate temperature was raised to 400℃,the thickness uniformity of the deposited film reached±5%,and the film surface was flat and crack-free.
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