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残余应力对介质高反膜面型影响的研究

Study on the Influence of Residual Stress on Dielectric High Reflection Films

  • 摘要: 使用有限元分析方法对介质激光高反镜镀膜前后的元件面型变化及膜层应力分布进行研究,仿真结果表明:残余应力和热应力都呈层状分布,基底应力从下到镀膜面由拉应力变为压应力,应力引起面型变化呈环状分布。对于熔石英基底,当厚径比小于1∶20时,重力引起的变形不可忽略。当熔石英(φ=200 mm,d=2 mm)表面为由重力引起的曲面且膜系为G│(HL)10H│A的TiO2-SiO2组合时,镀膜元件面型变化减小1.45μm,修正了理想平面镀膜仿真的不足,为大口径微变形镀膜元件的制备提供指导。

     

    Abstract: The finite element analysis method is used to study the change of dielectric laser high mirror component surface profile and the distribution of film stress before and after the coating.The simulation results show that the residual stress and thermal stress are distributed in layers, the stress in substrate changes from tensile stress to compressive stress from the bottom to the film surface, and the stress-induced surface changes are in a circular distribution.When the ratio of thickness to diameter is less than 1:20,the deformation caused by gravity cannot be ignored for fused silica substrate.When the surface of fused silica(φ=200 mm, d=2 mm) is a curved surface caused by gravity and the film system is composed of TiO2-SiO2 of G│(HL)10H│A,the change of surface shape of the film-coated component is reduced by 1.45 μm, which corrects the deficiency of ideal plane film simulation and provides guidance for the preparation of large diameter micro deformation coated components.

     

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