真空断路器弧后鞘层发展过程仿真分析
Simulation Analysis of the Post-Arc Sheath Development Process for the Vacuum Circuit Breaker
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摘要: 以真空断路器弧后鞘层发展过程为对象,采用等离子体流体力学模型,求解电子、离子密度和平均电子能量的漂移扩散方程和耦合电场的泊松方程,引入粒子间碰撞反应,仿真分析其弧后介质恢复变化和鞘层发展阶段电子和离子的空间分布、密度分布以及间隙电势分布。采用对比分析法,研究不同初始条件对鞘层发展的影响,结果表明:在保持其余参数不变的条件下,暂态恢复电压(TRV)斜率和间隙轴向长度均与鞘层发展速度呈正相关,初始等离子体密度和弧后金属蒸气压强均与鞘层发展速度呈负相关。Abstract: The development process of post-arc sheath of vacuum circuit breaker is studied with the plasma fluid dynamics model applied.The drift diffusion equation of electron,ion density and average electron energy and coupling electric field Poisson equation is computed,the collision reaction between particles is introduced to simulate and analyze the spatial distribution,density distribution and potential distribution of electrons and ions in the post-arc dielectric recovery and sheath development stage.Moreover,control varieties is used to study the effects of different initial conditions on sheath development,the results show that:when other parameters remain unchanged,both the TRV slope and the axial length of the gap are positively correlated with the sheath development speed,the initial plasma density and post-arc metal vapor pressure are both negatively correlated with the sheath development speed.