Abstract: In order to further explore the influencing factors of radio frequency capacitively coupled plasma(RF-CCP),a one-dimensional emission device of CCP was constructed using the numerical simulation method.The RF source was applied,and the simulation gas was set to helium,with a constant distance of 75 mm between the plates.This paper studies the effects of the thickness and dielectric constant of the inserted barrier material on the average electron density,average electron temperature,and potential between electrode plates.The simulation results are as follows:The larger the dielectric constant of the inserted barrier material,the larger the maximum value of the periodic average of electron density in the middle of the gas gap,the smaller the maximum value of the periodic average of potential in the high electron density region,and the larger the maximum value of the periodic average of electron temperature near the barrier material,but its minimum value in the gas gap middle is basically the same.With the increase of the thickness of the barrier material,the maximum value of the periodic average of electron density first increases and then decreases.The thickness of the barrier material has an optimal value,and the optimal value increases with the dielectric constant.Although the maximum values of the periodic average of potential and the periodic average of potential at the boundary between the barrier material and the gas are proportional to the thickness of the barrier material,their differences are approximately constant as the thickness of the barrier material increases.These results have a great significance for improving the performance of traditional RF-CCP.