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物理气相沉积薄膜超级电容器

Physical Vapor Deposition Thin Film Supercapacitors

  • 摘要: 超级电容器作为一种可以快速充放电的储能器件,在电动汽车、微储能电子器件、航空航天等领域有广泛的应用前景。金属氮/氧化物薄膜电极具有优良的电化学性能以及稳定的机械性能,使其成为一种极具发展潜力的超级电容器电极材料。物理气相沉积(PVD)制备的薄膜具有成分结构易调控,膜层与基体结合力好,且可规模化生产等优点,可应用在超级电容器领域,特别是柔性薄膜超电电极的制备。本文论述了PVD在制备氮/氧化物薄膜电极方面的研究进展,并详细探讨了通过PVD制备的金属氮氧化物以及多元金属氮化物薄膜电极的可行性以及PVD柔性薄膜电极的发展前景。

     

    Abstract: As one kind of energy storage device that can be rapidly charged and discharged, supercapacitors have shown a broad application prospect in electric vehicles, micro-energy storage devices, aerospace, and other fields. Transition metal nitrogen/oxide films have excellent electrochemical properties and mechanical stabilities,which makes them promising electrode materials for supercapacitors. The thin films prepared by physical vapor deposition(PVD)possess advantages of easily adjusted composition and structure, good adhesion strength between the films and substrates, and large-scale production, which can be applied in the field of supercapacitors, especially for the preparation of flexible thin-film supercapacitors devices. In this paper, the research progress of nitrogen/oxide thin-film supercapacitors by PVD is reviewed. The feasibility of metal oxynitrides and multicomponent nitride thin-film electrodes prepared by PVD, and the development prospect of PVD flexible thin-film supercapacitors are discussed.

     

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