Effect of Pulse Bias Voltage on Solid Lubrication Behavior of Magnetron Sputtered MoS2 Coatings
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摘要: 利用单极性脉冲磁控溅射方法, 采用300, 600, 800 V的脉冲偏压, 分别在A286铁基高温合金基底上沉积了MoS2涂层, 并对其进行了组织和性能研究, 结果表明:所制备的涂层表面存在成核势垒, 呈岛状生长模式, 磁控溅射过程中, 高能粒子的轰击改变了涂层表面晶格畸变程度及涂层与基体界面之间的热应力, 使得涂层结合强度随偏压的增加先减小再增大, 800 V偏压下涂层缺陷最少, 内应力最低, 结合强度最好。300和800 V脉冲偏压下, 涂层沿平行于MoS2层片的非极性 (002) 解理面择优取向, 摩擦系数随摩擦阻力的减小降低, 600 V偏压下, 涂层沿 (100) 极性面择优取向, 摩擦阻力最大, 磨痕边缘有不同程度的犁沟痕迹, 磨损机理主要为磨粒磨损。Abstract: The MoS2 coatings, as a solid lubrication material for nuclear fusion reactor, were deposited by single-polarity pulse magnetron sputtering on substrate of iron-based alloy A286. The influence of the pulse bias voltage on the microstructures, interfacial adhesion and tribological properties of the coatings was investigated with X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy and mechanical probes. The results show that the pulse bias voltage had a major impact. For example, as the bias voltage increased from 300 to 800 V, the interfacial adhesion changed in a decrease-increase mode, accompanied by an increase-decrease variation in the grainsize; grown at 800 V, the MoS2 coating had the lowest defect-density, highest compactness, weakest internal stress, and strongest interfacial adhesion, because of high-energy particles bombardment. The preferential island growth orientation and friction also depended on the pulse bias voltage; and the abrasive wear mechanism dominated.
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[1] Hathiramani D, Lingertat J, Eetena P V, et al.Full-Scale Friction Test on Tilted Sliding Bearings for Wendelstein7-X Coils[J].Fusion Engineering and Design, 2009, 84:899-902
[2] Koch F, Nocentini R, Heinemann B, et al.MoS2 Coatings for the Narrow Support Elements of the W-7X Nonplanar Coils[J].Fusion Engineering and Design, 2007, 82:1614-1620
[3] 康嘉杰, 李国禄, 王海斗, 等.层状固体润滑薄膜的研究进展[J].金属热处理, 2007, 32 (4):15-18 [4] 胡志彪, 李贺军, 付前刚, 等.低摩擦系数固体润滑涂层研究进展[J].材料工程, 2006, 3:60-68 [5] 郭青.MoS2固体润滑性能及其应用[J].精密制造与自动化:2007, 3:26-29 [6] 郑友华, 李冀生, 王平, 等, MoS2基润滑涂层在润滑油中的作用机理及实际应用[J].润滑与密封, 2005, 2:127-132 [7] 焦广发, 周兰英, 员一泽.MoS2涂层制备方法研究[J].润滑与封, 2008, 30 (1):125-128 [8] 王吉会, 杨静.磁控溅射MoS2薄膜的生长特性研究[J].润滑与密封, 2005, (6):12-14 [9] Bülbül F, Efeo4lu 6) I, Arslan E, et al.The Effect of Bias Voltage and Working Pressure on S/Mo Ratio at MoS2-Ti Composite Films[J].Applied Surface Science, 2007, 253 (9):4415-4419
[10] 李浩, 李霞, 张广安, 等, 磁控溅射沉积抗氧化、长寿命MoS2基复合薄膜[J].摩擦学学报, 2016, 36 (6):708-716 [11] Singh H, Mutyala K C, Mohseni H, et al.Tribological Performance and Coating Characteristics of Sputter-Deposited Ti-Doped MoS2in Rolling and Sliding Contact[J].Tribology Transactions, 2015, 58 (5):767-777
[12] 温诗铸.润滑理论研究的进展与思考[J].摩擦学学报, 2007, 27 (6):497-503 [13] 楼小玲, 鲍雨梅, 柴国钟, 等.基于Hertz接触理论的涂层界面应力分析[J].浙江工业大学学报, 2006, 34 (5):563-566
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