钨坩埚蒸镀金膜表面黑色颗粒的控制研究
Reduction of Black Gold-Carbon Clusters in Gold Thin Films Deposited by Electron Beam Evaporation
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摘要: 采用钨坩埚进行电子束蒸镀金膜是微电子工艺制备电极常用工艺之一, 然而在使用钨坩埚蒸发金时会有微小的黑色颗粒出现在金膜的表面, 对微纳尺寸下金电极或引线的性能具有严重的影响。研究发现调整蒸镀功率和其他工艺条件, 黑色颗粒数目有明显变化, 随着功率的增加黑色颗粒数目先减少后增加。利用“咖啡环效应”原理, 将电子束蒸发功率先升高再降低, 既控制了蒸发速度, 又成功减少了金膜表面的黑色颗粒, 为教学实验、真空镀膜工艺和集成电路生产领域提供参考。Abstract: We addressed the problem of black Au-C cluster formation in Au thin films grown by electron beam evaporation. The influence of the electron beam evaporation power on the black-cluster number was investigated.The results show that the electron beam evaporation power significantly affected the deposition rate and number of the black particles. For example, as the electron evaporation power increased in a given range, the deposition rate increased and the number of black particles changed in a decrease-increasemanner, possibly because an increase of the power roseup the liquid Au temperature, and the decreasing surface tension drove the C-impurity to the W-crucible wall and resulted in the so-called " coffee ring effect". We suggest that an optimized“increase-decrease”adjustment ofthe evaporation power in the initial film-growth stage may considerably reduce the number of black particles on Au-film surface.