Process Optimization for Eliminating Stress Ring Defects in Magnetron Sputtered Cr Films

To address the issues of periodic concentric circular fringes and stress ring defects observed in the magnetron sputtering deposition of Cr thin films, this paper proposes a process optimization strategy combining working pressure regulation with dual-target co-sputtering. The effects of various working pressures and target configurations on stress distribution were systematically investigated and compared through experiments. The results indicate that increasing the working pressure and introducing a dual-target confocal facing sputtering configuration can significantly enhance the scattering of sputtered particles during transport, thereby effectively mitigating the bombardment of high-energy particles on the substrate. The optimized process successfully eliminated the concentric circular fringe defects on the film surface and significantly improved the uniformity of stress distribution, providing a reproducible technical pathway for the fabrication of high-quality chromium thin films.