Effect of Sputtering Pressure on Structure Regulation and Electrocatalytic Performance of MoS₂ Coatings

MoS₂ exhibits a distinctive electronic configuration akin to that of platinum, it is considered as a potential catalyst for transition metal sulfide hydrogen evolution reaction (HER). Nevertheless, the catalytic efficiency of MoS₂ in hydrogen evolution is hampered by insufficient active sites and inadequate electrical conductivity. This study presents a technique for fabricating MoS₂ coatings as an electrocatalyst for HER using magnetron sputtering. The microstructure, microstructure morphology and HER activity in alkaline media of MoS₂ coatings were investigated by preparing MoS₂ coatings at different argon pressures of 0.5 Pa, 1.0 Pa, 1.5 Pa and 2.0 Pa. Results show that the MoS₂ coating grows along the (100) crystal surface under different Ar pressures, exposing most of the active sites. At the same time, 1T phase MoS₂ appears in the coatings at low Ar pressure, and the 1T phase component is the most at 1.0 Pa, and the conductivity is stronger. In a 1 mol/L potassium hydroxide (KOH) solution, the overpotential of the coating at current densities of 10 mA/cm² and 100 mA/cm² is 149 mV and 225 mV, respectively, and the Tafel slope is 75 mV·dec⁻¹.