Influence of Mg₈₅Ni₁₅ Anti-Reflection Layers on Photoelectric Properties of the VO₂ Thin Films on Glass Substrate

A monoclinic phase of vanadium dioxide (M-VO₂) film was grown on an amorphous glass substrate by pulsed laser deposition technique, and the effect of the Mg₈₅Ni₁₅ anti-reflection layers on the M-VO₂ film was investigated. The experimental results show that the M-VO₂ film prepared on the amorphous glass substrate has a single orientation and high purity. As an anti-reflection layer, Mg₈₅Ni₁₅ improves the visible light transmittance and solar energy adjustment rate of the film. By optimizing the thickness of the anti-reflection layer, it is found that when the thickness of the anti-reflection layer is 60 nm, the phase transition temperature is the lowest and the thermal hysteresis width is the narrowest at 6℃. The development of this work is conducive to promoting the application of VO₂ thin films in smart windows.