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YANG Haitao. Atomic Manufacturing Technology for the Future Information Devices[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2023, 43(5): 367-389. DOI: 10.13922/j.cnki.cjvst.202304007
Citation: YANG Haitao. Atomic Manufacturing Technology for the Future Information Devices[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2023, 43(5): 367-389. DOI: 10.13922/j.cnki.cjvst.202304007

Atomic Manufacturing Technology for the Future Information Devices

  • With the development of the future information devices towards smaller sizes, lower energy consumption, and higher properties, the manufacturing technology must enter the atomic scale. The atomic manufacturing technology will produce the revolutionary new materials and devices. This review summaries some fabrication methods to be developed scalable atomic manufacturing technologies such as molecular beam epitaxy, scanning probe manipulation, chemical vapour fabrication, and atom-scale etching. The problems, prospect, and tendency in the development of atomic manufacturing technology for the future information devices have been discussed.
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