Effects of Bias Voltage on Zirconium Film Deposited by Arc Ion Plating

In order to study the effect of bias voltage on the properties of zirconium film deposited by arc ion plating and to investigate the oxidation degree of zirconium film under different storage conditions, several groups of samples were prepared by adjusting the bias voltage and duty cycle during the deposition process. Scanning electron microscope (SEM), X-ray thickness gauge, X-ray diffractometer (XRD), and nano-scratch instrument were used to study the surface morphology, deposition rate, structure, and adhesion of the film. The oxidation degree of zirconium film in different storage conditions was tested by X-ray photoelectron spectroscopy (XPS). With the increase of bias voltage, the repulsive force of the workpiece on the large particles with negative charge increases, and the bombardment effect on the large particles deposited on the surface increases, so the surface finish is improved. At the same time, the re-sputtering effect of high-energy particles increases and reduces the deposition rate of the film. In addition, with the increase of deposition energy, the adhesion has a tendency to increase, and the preferred tendency of the (100) crystal planes of the film layer gradually decreases. The increase of the bias duty cycle will also increase the kinetic energy of the target ions when they pass through the sheath, and the enhancement of the re-sputtering effect will reduce the deposition rate. The thickness of the oxide layer of the zirconium film gradually increases with the storage time, and the degree of oxidation in the atmosphere exposed for one day is more serious than that in the vacuum storage (10⁻⁵ Pa) for half a year.