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HE Qinglin. Stencil Lithography for in-Situ Fabricating Quantum Devices[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2023, 43(3): 163-176. DOI: 10.13922/j.cnki.cjvst.202208004
Citation: HE Qinglin. Stencil Lithography for in-Situ Fabricating Quantum Devices[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2023, 43(3): 163-176. DOI: 10.13922/j.cnki.cjvst.202208004

Stencil Lithography for in-Situ Fabricating Quantum Devices

  • The growth of single-crystal films over a desired area but nowhere else could be accomplished using the stencil lithography technique. Served as an accessory for different material synthesis methods, this technique could be used for depositing various materials particularly the emergent quantum materials. We review the applications of stencil lithography for in-situ fabricating quantum material devices in mesoscopic scale. The basics of stencil lithography with the main specifications and advantages are introduced, followed by describing how quantum materials can be benefitted from these characteristics and advantages. We highlight the applications of stencil lithography to the material engineering and the in-situ fabrications of quantum devices. The present review describes a new disciplinary direction between the fabrication technique and quantum materials, which gets more and more attention and deserves further investigations.
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