Citation: | ZHANG Jian, LI Jianhao, QI Zhenhua, XU Quanguo, TANG Zhicong. Effect of DC Magnetron Sputtering on the Properties of Thin Films Deposited on the Surface of Shaped Workpieces[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2022, 42(3): 223-227. DOI: 10.13922/j.cnki.cjvst.202110013 |
[1] |
王德山,陈尤旭,胡兵兵.复杂腔体件表面磁控溅射镀膜关键技术的研究[J].现代机械,2018,(01):80-83
|
[2] |
Kelly P J,Arnell R D.Magnetron Sputtering:A Review of Recent Developments and Applications[J].Vacuum,2000,56:159-172
|
[3] |
贾嘉.溅射法制备纳米薄膜材料及进展[J].半导体技术,2004,29(7):70-73
|
[4] |
Musil J,Vlček J.A Perspective of Magnetron Sputtering in Surface Engineering[J].Surface&Coatings Technology,1999,112(1)
|
[5] |
陈扬枝,万玉林,吕月玲.多弧离子镀的工艺参数对Ti Al N膜层性能的影响[J].热加工工艺,2019,(12):103-107
|
[6] |
张健,牛夏斌,齐振华,等.探究氧气流量对新型高阻隔薄膜材料的制备及性能的影响[J].真空科学与技术学报,2021,41(07):694-698
|
[7] |
杨玉楼,周建伟,刘玉岭,等直流磁控溅射制备非晶硅薄膜的研究[J].电子设计工程,2010,18(4):105-107
|
[8] |
汪博洋.热处理对Cr/Au双层薄膜显微结构和应力的影响[D].哈尔滨:哈尔滨工业大学,2013
|
[9] |
杨仲秋.工作气压对磁控溅射薄膜的影响[J].黑龙江科学,2019,10(14):38-39
|
[10] |
朱国.磁控溅射镀膜相关物理过程的多尺度模拟与实验研究[D].武汉:华中科技大学,2019
|
[11] |
Yang Z,Yang L,Dai B,et al.Uniform Films Deposited on Convex Surfaces by Magnetron Sputtering with a Small Target[J].Thin Solid Films,2018,665:1-5
|
[12] |
潘瑶,曲天梁,杨开勇,等.半球谐振陀螺研究现状与发展趋势[J].导航定位与授时,2017,(4):9-13
|
[13] |
Yi P,Zhu L,Dong C,et al.Corrosion and in Terfacial Contact Resistance of 316L Stainless Steel Coated with Magnetron Sputtered Zr N and Ti N in the Simulated Cathodic Environment of a Proton-Exchange Embrane Fuel Cell[J].Surface and Coatings Technology,2019,363:198-202
|
[14] |
Poxson D,Mont F,Schubert M,et al.Quantification of Porosity and Deposition Rate of Nanoporous Films Grown by Oblique-Angle Deposition[J].Applied Physics Letters,2008,93:101914-101914
|
[15] |
Qi Z,Wei B,Wang J,et al.Nanostructured Porous Cr NThin Films by Oblique Angle Magnetron Sputtering for Symmetric Supercapacitors[J].Journal of Alloys and Compounds,2019,806:953-959
|
[16] |
Liu H Y,Deng Q Y,Ma D L,et al.The Uniformity of Ti NFilms Deposited on the Inner Surfaces of a Hemispherical Workpiece by High-Power Pulsed Magnetron Sputtering[J].International Journal of Modern Physics B,2019,3(28)
|
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