Study of Antireflection and Barrier Films Prepared by Plasma-Enhanced Atomic Layer Deposition

Flexible composite materials with high barrier and high light transmittance have high application value in packaging and electronic packaging.In this paper,plasma-enhanced atomic layer deposition technology was used to prepare a multilayer antireflection barrier film on the PET substrate.The process parameters of plasmaenhanced atomic layer deposition to prepare silicon oxide and silicon nitride were studied,and optical simulation software was used to design the required transparency film structure.The results show that the surface morphology of the film AFM prepared by plasma enhanced atomic layer deposition is uniform and the film is dense.The infrared spectrum shows that the prepared film is high-purity SiO₂ and Si₃N₄.The water permeability of the film is reduced by 2 orders of magnitude,and the visible light range The transmittance can reach 94%.