Novel Cluster Tool for Multilayer Nanofilm Deposition: An Instrumentation Study

A novel type of cluster tool has been successfully developed for growth of multilayered nanofilm and nanostructured patterns.The cluster tool can be conveniently used for high precision synthesis of multilayered nanofilm in quite a few techniques in a specific vacuum chamber,including,but not limited to the plasma enhanced atomic layer deposition(PEALD),thermal atomic layer deposition(TALD),DC and RF magnetron sputtering.The lab-designed rotary transfer platform allows for rapid transfer of a substrate and/or a pre-coated nanofilm sample,in 2~3 s at a base pressure of 5×10^-5 Pa,between chambers from one subunit to any other subunit to deposit different layers in different growth modes without exposure to air which prevents oxidation,contamination and deterioration of film properties.Test results show that the newly-developed cluster tool meets the stringent design requirements.