Intelligent Control of Plasma Enhanced Chemical Vapor Deposition Reactor on Industrial Scale

We reported the intelligent control of the plasma enhanced chemical vapor deposition(PECVD) reactor in fabrication of thin film transistor liquid crystal display(TFT-LCD) device on industrial scale.Based on Fault Detection & Classification(FDC) solution and trouble-shooting experience,the self-developed control unit comprised four key subunits:including the subunits of RF power supply,flow-rate of reactive gases,time evolution of pressure distribution in film-growth stages,and auxiliary equipment,such as the transport/heating/remote-cleaning of substrate and etc.The newly-developed control unit was tested in production line.The preliminary results show that the novel intelligent control unit works pretty well.For example,it is capable of monitoring the film growth conditions in real-time,intelligently locating abnormal equipment/faulty-parts,increasing efficiency/service life,and enhancing rate of finished products in fabrication of TFT-LCD devices.