Synthesis of TiN Coatings on Argon Ion Sputtered Substrates of Ti Alloy and Si Wafer

The TiN coatings were deposited by cathodic arc ion plating, on the substrates of Ti-alloy and n-type Si (100) wafer activated by pre-sputtering of Ar-ions.The influence of the sputtering time on the microstructures, triboligical behavior and interfacial adhesion was investigated with scanning electron microscope and conventional mechanical probes.The results show that depending on Ar-ion current, the pre-sputtering time had a major impact.For example, as the sputtering time increased to 15 mim, the increase of reaction-activity of substrate surface significantly improved the nucleation density, deposition rate, hardness, friction coefficient, wear-resistance, interfacial adhesion and compactness of the TiN coatings.The interfacial adhesion of the TiN coating and the substrate pre-sputtered for 15 min was estimated to be over 65 N.However, over-sputtering resulted in deterioration.Possible mechanism responsible for the improvements was tentatively discussed in a thought provoking way.