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Shi Peng, Zhang Gong, Zhang Yushuai, Wang Lirong. Synthesis and Characterizationof Band-Pass Filter Fabricated with Ion-Beam Sputtered Ta2O5 and SiO2 Coatings for Optical Communication[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2019, 39(2): 136-139. DOI: 10.13922/j.cnki.cjovst.2019.02.08
Citation: Shi Peng, Zhang Gong, Zhang Yushuai, Wang Lirong. Synthesis and Characterizationof Band-Pass Filter Fabricated with Ion-Beam Sputtered Ta2O5 and SiO2 Coatings for Optical Communication[J]. CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, 2019, 39(2): 136-139. DOI: 10.13922/j.cnki.cjovst.2019.02.08

Synthesis and Characterizationof Band-Pass Filter Fabricated with Ion-Beam Sputtered Ta2O5 and SiO2 Coatings for Optical Communication

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  • Received Date: June 20, 2018
  • Available Online: September 12, 2023
  • A novel type of high-performance band pass filter, comprising 12 Fabry-Perot (F-P) resonator cavities and fabricated from Ta2O5 and SiO2 layers synthesized by ion beam sputtering, was developed for optical communication.The influence of the deposition conditions, particularly the layer thickness, on the characteristics of the newly-developed band pass filter was investigated.The results show that the precision control of layer-thickness has a major impact.To be specific, the combination of optical and deposition time control-schemes was capable of precisely controlling the thickness of coupling layers, grown under the optimized conditions.The properties of the newly-designed stable band pass filter included:an insertion-loss of below 0.2 dB in 1479 ~1504 nm range and a transmission-isolation of above 40 dB in 1470~1521 nm and 1578~1651 nm ranges, satisfying well the stringent requirements of optical communication.
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