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PECVD设备Leak在线监控系统创建及应用

Real-Time Monitoring of Leaked Air in Plasma Enhanced Chemical Vapor Deposition Reactor: An Experimental Study

  • 摘要: 等离子体增强型化学气相沉积法(PECVD)设备具有高真空特点,容易发生漏气(Leak)事故,为预防事故发生,对PECVD腔室构造、成膜原理及过程进行深入分析。从原理上检讨通过光谱分析方法在线监控PECVD工艺腔室Leak的可行性,搭建了腔室在线监控系统。通过光谱条件的调整测试,发现Ar等离子状态下,Leak光谱和正常光谱差异最大化,更有利于Leak光谱检测,成功实现Leak在线检测,在行业内首次实现PECVD真空腔室在线监控功能。

     

    Abstract: A novel technique was developed,for the first time to monitor in real-time the leakage of air into the high vacuum chamber of RF plasma enhanced chemical vapor deposition(RF-PECVD) reactor by analyzing the plasma emission spectrum with Real Time Plasma Spectrum Analyzer(RIPSA),comprising the spectrometer,USB device server,controller,optical fiber and monitor display.The influence of the gas medium with and without leaked air on the plasma emission spectra was investigated.The results show that the leaked air significantly affected the plasma emission spectrum,and that when it comes to leak detection of air with RIPSA,Ar-plasma outperforms H2-plasma because of higher accuracy,bigger spectral difference and easier operation.We suggest that the rea-time leak monitoring/alarming with RIPSA may be of much technological interest in industrial fabrication of thin film transistors for liquid crystal display.

     

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